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Kev Ua Haujlwm Tshwj Xeeb ntawm Al2O3 Ceramic Wafer Chuck
Tsim los ntawm kev nias txias isostatic thiab sintered nyob rau hauv qhov kub siab, tom qab ntawd precision machined thiab polished, cov khoom seem ceramic tuaj yeem ua tau raws li txhua qhov kev cai nruj ntawm cov khoom siv semiconductor nrog nws cov yam ntxwv ntawm kev hnav tsis kam, corrosion tsis kam, thermal nthuav dav tsawg, thiab rwb thaiv tsev. Ceramics tuaj yeem ua haujlwm hauv ntau hom khoom siv semiconductor nrog qhov kub siab, nqus tsev lossis roj corrosive rau lub sijhawm ntev.
Ua los ntawm cov hmoov alumina purity siab, ua tiav los ntawm kev nias txias isostatic, sintering kub siab thiab ua tiav qhov tseeb, nws tuaj yeem ncav cuag qhov ntev kam rau ± 0.001 hli, qhov chaw tiav Ra 0.1, kub tsis kam 1600 ℃.
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ST.CERA Cov Khoom Siv Semiconductor Uas Kho Kom Haum Rau Cov Khoom Siv Ceramic Phaj
Tsim los ntawm kev nias txias isostatic thiab sintered nyob rau hauv qhov kub siab, tom qab ntawd precision machined thiab polished, cov khoom seem ceramic tuaj yeem ua tau raws li txhua qhov kev cai nruj ntawm cov khoom siv semiconductor nrog nws cov yam ntxwv ntawm kev hnav tsis kam, corrosion tsis kam, thermal nthuav dav tsawg, thiab rwb thaiv tsev. Ceramics tuaj yeem ua haujlwm hauv ntau hom khoom siv semiconductor nrog qhov kub siab, nqus tsev lossis roj corrosive rau lub sijhawm ntev.
Ua los ntawm cov hmoov alumina purity siab, ua tiav los ntawm kev nias txias isostatic, sintering kub siab thiab ua tiav qhov tseeb, nws tuaj yeem ncav cuag qhov ntev kam rau ± 0.001 hli, qhov chaw tiav Ra 0.1, kub tsis kam 1600 ℃.
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12-Nti Alumina Nqus Tsev Chuck rau 300mm Wafer Ua Haujlwm
St.Cera lub tshuab nqus tsev chuck loj 12 nti yog ua los ntawm 99.8% alumina uas muaj purity siab (Al₂O₃) rau kev siv wafer 300 hli. Lub chuck muaj qhov chaw zoo nkauj (qhov dav ntawm qhov grooved yog 0.5–1.0 hli, qhov pitch yog 2–3 hli) kom ntseeg tau tias muaj kev faib tawm ntawm lub tshuab nqus tsev thoob plaws 300 hli txoj kab uas hla. Qhov tiaj tiaj yog tswj tau hauv 5 μm, ua rau lub wafer tsis muaj warp thaum lub sijhawm dicing, sib tsoo sab nraub qaum, thiab tshuaj xyuas. Lub zog flexural siab (361 MPa) thiab qhov nyuaj (16 GPa) lav qhov ruaj khov ntev txawm tias nyob hauv lub voj voog nqus tsev rov ua dua.
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Alumina Ceramic End Effector nrog Integrated Vacuum Channels
Lub tshuab nqus tsev alumina ntawm St.Cera muab cov kav dej nqus tsev uas raug tshuab ua kom raug thiab cov qhov nqus tsev ncaj qha rau hauv lub cev alumina uas muaj 99.8% huv si. Tus qauv tsim no tshem tawm cov ntaub nqus tsev sab nraud, ua rau cov wafer khaws tau ncaj qha nrog lub zog tuav sib npaug. Lub zog khoov siab ntawm cov khoom siv (361 MPa) thiab qhov nyuaj (16 GPa) ua kom muaj kev ruaj khov ntev hauv qab lub voj voog nqus tsev rov ua dua. Kev tiaj tiaj thoob plaws thaj chaw pad tau tswj hwm hauv 10 μm, tiv thaiv kev ntxhov siab thiab kev tawg ntawm wafer. Cov chaw nqus tsev nyob ntawm lub flange mounting tom qab kom yooj yim koom ua ke nrog OEM robot caj npab.
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ESD-Safe Alumina Ceramic Parts rau Static-Relative Wafer Handling
Cov khoom siv alumina ceramic uas muaj ESD (electrostatic discharge) yog tsim los ntawm 99.8% purity Al₂O₃ nrog rau qhov resistivity ntawm 10⁶–10⁹ Ω/sq, ua tiav los ntawm kev siv cov txheej txheem doping lossis txheej txheem. Cov khoom no ua kom cov nqi hluav taws xob ploj mus zoo, tiv thaiv kev puas tsuaj electrostatic rau cov wafers thiab cov khoom siv semiconductor rhiab heev. Cov khoom siv hauv paus tseem khaws nws lub zog flexural siab (361 MPa), hardness (16 GPa), thiab dielectric zog (15 × 10⁶ V/m). Cov khoom siv ceramic uas muaj ESD muaj xws li cov khoom siv kawg, cov pins nqa, cov rails qhia, thiab cov khoom siv kho kom haum rau FAB automation.
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Cov Khoom Siv Ceramic rau Cov Khoom Siv Semiconductor Probe
Tsim los ntawm kev nias txias isostatic thiab sintered nyob rau hauv qhov kub siab, tom qab ntawd precision machined thiab polished, cov khoom seem ceramic tuaj yeem ua tau raws li txhua qhov kev cai nruj ntawm cov khoom siv semiconductor nrog nws cov yam ntxwv ntawm kev hnav tsis kam, corrosion tsis kam, thermal nthuav dav tsawg, thiab rwb thaiv tsev. Ceramics tuaj yeem ua haujlwm hauv ntau hom khoom siv semiconductor nrog qhov kub siab, nqus tsev lossis roj corrosive rau lub sijhawm ntev.
Ua los ntawm cov hmoov alumina purity siab, ua tiav los ntawm kev nias txias isostatic, sintering kub siab thiab ua tiav qhov tseeb, nws tuaj yeem ncav cuag qhov ntev kam rau ± 0.001 hli, qhov chaw tiav Ra 0.1, kub tsis kam 1600 ℃.
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Cov Khoom Siv Semiconductor Ceramic Plate
Tsim los ntawm kev nias txias isostatic thiab sintered nyob rau hauv qhov kub siab, tom qab ntawd precision machined thiab polished, cov khoom seem ceramic tuaj yeem ua tau raws li txhua qhov kev cai nruj ntawm cov khoom siv semiconductor nrog nws cov yam ntxwv ntawm kev hnav tsis kam, corrosion tsis kam, thermal nthuav dav tsawg, thiab rwb thaiv tsev. Ceramics tuaj yeem ua haujlwm hauv ntau hom khoom siv semiconductor nrog qhov kub siab, nqus tsev lossis roj corrosive rau lub sijhawm ntev.
Ua los ntawm cov hmoov alumina purity siab, ua tiav los ntawm kev nias txias isostatic, sintering kub siab thiab ua tiav qhov tseeb, nws tuaj yeem ncav cuag qhov ntev kam rau ± 0.001 hli, qhov chaw tiav Ra 0.1, kub tsis kam 1600 ℃.
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Cov Khoom Siv Semiconductor Ceramic Spare Parts
Tsim los ntawm kev nias txias isostatic thiab sintered nyob rau hauv qhov kub siab, tom qab ntawd precision machined thiab polished, cov khoom seem ceramic tuaj yeem ua tau raws li txhua qhov kev cai nruj ntawm cov khoom siv semiconductor nrog nws cov yam ntxwv ntawm kev hnav tsis kam, corrosion tsis kam, thermal nthuav dav tsawg, thiab rwb thaiv tsev. Ceramics tuaj yeem ua haujlwm hauv ntau hom khoom siv semiconductor nrog qhov kub siab, nqus tsev lossis roj corrosive rau lub sijhawm ntev.
Ua los ntawm cov hmoov alumina purity siab, ua tiav los ntawm kev nias txias isostatic, sintering kub siab thiab ua tiav qhov tseeb, nws tuaj yeem ncav cuag qhov ntev kam rau ± 0.001 hli, qhov chaw tiav Ra 0.1, kub tsis kam 1600 ℃.
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Lub nplhaib foob Alumina Ceramic uas muaj purity siab rau kev kaw lub chamber kub siab
St.Cera lub nplhaib foob ceramic yog tsim los ua lwm txoj hauv kev rau polymer O-rings hauv qhov chaw kub heev uas elastomers lwj. Ua los ntawm 99.8% alumina siab-purity (Al₂O₃), lub nplhaib foob ruaj khov no yog siv rau hauv cov ntawv thov sealing static - feem ntau ua ke nrog cov hlau mos lossis graphite gasket - los muab kev tswj hwm lub tshuab nqus tsev lossis roj ntawm qhov kub txog li 800 ° C thiab hauv cov plasma lossis cov chaw tshuaj lom neeg. Cov khoom siv muaj xoom outgassing, lub zog compressive siab (lub zog flexural hauv qab 361 MPa), thiab tshuaj inertness (tiv taus halogens, acids, thiab alkalis tshwj tsis yog HF). Cov chaw sealing precision-lapped (flatness ≤5 μm, surface roughness Ra ≤0.2 μm) ua kom muaj kev sib cuag nrog cov hlau lossis cov khoom ceramic.
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High-Purity Alumina Chamber Focus Ring rau Plasma Etch & CVD Systems
St.Cera lub nplhaib tsom iav chamber yog ib qho khoom siv tseem ceeb uas siv rau hauv cov khoom siv plasma etch, CVD, thiab PVD semiconductor. Ua los ntawm 99.8% alumina uas muaj purity siab (Al₂O₃), lub nplhaib puag ncig ntug wafer kom txwv plasma thiab ua kom zoo dua qhov kev faib tawm ntawm ion, yog li txhim kho qhov sib xws ntawm etch thoob plaws qhov chaw wafer. Cov khoom siv no muaj kev tiv thaiv plasma zoo heev, lub zog dielectric siab (15 × 10⁶ V / m), thiab kev ruaj khov thermal txog li 1600 ° C, ua kom ntseeg tau tias muaj kev ntseeg siab mus sij hawm ntev hauv cov chaw plasma uas muaj fluorine- lossis chlorine. ID / OD thiab qhov tiaj tiaj (≤10 μm) ua rau muaj qhov chaw ntug wafer raug, txo cov qhov tsis zoo ntawm ntug thiab kev tsim cov khoom me me.
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Lub Nplhaib Alumina Ceramic Uas Muaj Peev Xwm Siab Rau CVD / PVD Txheej Txheem Chambers
Lub nplhaib ceramic ntawm St.Cera yog tsim tshwj xeeb rau kev siv hauv CVD (Chemical Vapor Deposition) thiab PVD (Physical Vapor Deposition) cov txheej txheem chambers. Ua los ntawm 99.8% high-purity alumina (Al₂O₃), lub nplhaib no ua haujlwm ua lub chamber liner, focus ring, lossis cov khoom siv txheej txheem los kaw cov plasma thiab tiv thaiv cov phab ntsa chamber los ntawm kev yaig. Cov khoom siv muaj kev tiv thaiv plasma zoo heev, lub zog dielectric siab (15 × 10⁶ V / m), thiab thermal stability txog li 1600 ° C, ua kom muaj kev pabcuam ntev hauv cov chaw plasma uas muaj fluorine. Kev kam rau siab meej (± 0.05 hli ntawm ID / OD) thiab flatness (≤ 10 μm) ua rau muaj kev sib xws ntawm ntug wafer, txhim kho kev sib npaug ntawm cov khoom tso tawm thiab txo cov khoom me me.
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Bernoulli Ceramic End Effector - Kev Tswj Xyuas Wafer Tsis Sib Chwv Rau Cov Wafer Nyias & Fragile
St.Cera's Bernoulli ceramic end effector siv aerodynamic lift los tuav cov wafers yam tsis muaj kev sib cuag. Ua los ntawm cov khoom siv siab-purity 99.8% alumina (Al₂O₃) lossis silicon carbide (SiC), nws muaj cov nozzles precision-machined uas tso cov roj siab los tsim ib daim nyias nyias ntawm qhov kawg effector thiab wafer. Lub hauv paus ntsiab lus tsis sib cuag no tshem tawm cov pa phem sab nraub qaum, ntug chipping, thiab kev puas tsuaj ntawm qhov chaw, ua rau nws zoo tagnrho rau cov wafers nyias (≤100 μm), tawg yooj yim, lossis warped. Lub ceramic substrate muab lub zog flexural siab (361 MPa rau Al₂O₃; txog li 550–600 MPa rau SiC), qhov hnyav tsawg, thiab qhov ruaj khov zoo heev, ua kom ntseeg tau tias rov ua dua qhov chaw hauv cov neeg hlau hloov wafer ceev ceev.
