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Nhazi ahaziri nke Al2O3 Efere Wafer Chuck
E ji igwe na-eme ka ihe dị n'ime seramiiki dị nro ma na-eme ka ọ dị ọcha n'okpuru okpomọkụ dị elu, wee jiri ya mee ihe nke ọma, akụkụ seramiiki ndị ahụ nwere ike imezu ihe achọrọ siri ike nke ngwaọrụ semiconductor, ya na atụmatụ ya dịka iguzogide iyi, iguzogide nchara, obere mgbasawanye okpomọkụ, na mkpuchi. Seramiiki nwere ike ịrụ ọrụ n'ọtụtụ ụdị ngwa mmepụta semiconductor nwere oke okpomọkụ, ikuku ma ọ bụ gas na-emebi emebi ruo ogologo oge.
Ejiri ntụ ntụ alumina dị ọcha mee ya, nke a na-eji ịpị isostatic oyi, imecha okpomọkụ dị elu na imecha ihe ziri ezi, ọ nwere ike iru nha nha ruo ±0.001 mm, imecha elu Ra 0.1, iguzogide okpomọkụ 1600℃.
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Ngwa Semiconductor ahaziri ahazi nke ST.CERA Efere seramiiki
E ji igwe na-eme ka ihe dị n'ime seramiiki dị nro ma na-eme ka ọ dị ọcha n'okpuru okpomọkụ dị elu, wee jiri ya mee ihe nke ọma, akụkụ seramiiki ndị ahụ nwere ike imezu ihe achọrọ siri ike nke ngwaọrụ semiconductor, ya na atụmatụ ya dịka iguzogide iyi, iguzogide nchara, obere mgbasawanye okpomọkụ, na mkpuchi. Seramiiki nwere ike ịrụ ọrụ n'ọtụtụ ụdị ngwa mmepụta semiconductor nwere oke okpomọkụ, ikuku ma ọ bụ gas na-emebi emebi ruo ogologo oge.
Ejiri ntụ ntụ alumina dị ọcha mee ya, nke a na-eji ịpị isostatic oyi, imecha okpomọkụ dị elu na imecha ihe ziri ezi, ọ nwere ike iru nha nha ruo ±0.001 mm, imecha elu Ra 0.1, iguzogide okpomọkụ 1600℃.
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Chuck Alumina Vacuum nke Inch 12 maka nhazi Wafer 300mm
E ji alumina dị ọcha nke dị sentimita iri na abụọ nke St.Cera mepụta ihe mkpuchi vacuum nke dị sentimita iri na abụọ site na 99.8% nke alumina dị elu (Al₂O₃) maka ijikwa wafer 300mm. Chuck ahụ nwere elu dị larịị (obosara oghere 0.5–1.0 mm, pitch 2–3 mm) iji hụ na ekesara oghere ahụ n'otu nha n'obosara 300mm dum. A na-ejigide ịdị larịị n'ime 5 μm, na-eme ka a na-etinye wafer na-enweghị warp n'oge ịkpụ, ịkpụ azụ, na inyocha ya. Ike flexural dị elu nke ihe ahụ (361 MPa) na ike siri ike (16 GPa) na-ekwe nkwa nkwụsi ike ogologo oge ọbụlagodi n'okpuru usoro vacuum ugboro ugboro.
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Ihe na-eme ka ihe ... ọ dị mma nke alumina seramiiki nwere ọwa ikuku agbakwunyere
Ihe na-eme ka ihe dị n'ime alumina nke St.Cera na-ejikọta ọwa ikuku a na-eji ígwè arụ ọrụ nke ọma na oghere mmiri ozugbo n'ime ahụ alumina dị ọcha nke 99.8%. Nhazi a na-ewepụ ihe mkpuchi ikuku mpụta, na-eme ka ihe a na-akpọ wafer pikọp ozugbo na ike ijide otu. Ike flexural dị elu nke ihe ahụ (361 MPa) na ike siri ike (16 GPa) na-eme ka akụkụ ya kwụsie ike ogologo oge n'okpuru usoro ikuku ugboro ugboro. A na-ejigide ịdị larịị n'ofe ebe pad ahụ n'ime 10 μm, na-egbochi nrụgide wafer na mgbawa. Ọdụ ụgbọ mmiri ikuku dị na flange nrụnye azụ maka njikọta dị mfe na ogwe aka robot OEM.
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Akụkụ seramiiki alumina nke ESD-Chekwa maka njikwa Wafer na-adịghị agbanwe agbanwe
A na-emepụta akụkụ seramiiki alumina dị nchebe nke St.Cera's ESD (electrostatic discharge) site na 99.8% dị ọcha nke Al₂O₃ nwere nguzogide elu ahaziri nke 10⁶–10⁹ Ω/sq, nke a na-enweta site na usoro doping ma ọ bụ mkpuchi nkeonwe. Akụkụ ndị a na-ewepụ chajị kwụ ọtọ nke ọma, na-egbochi mmebi electrostatic na wafers na ngwaọrụ semiconductor dị nro. Ihe ndabere ahụ na-ejigide ike flexural dị elu ya (361 MPa), ike (16 GPa), na ike dielectric (15×10⁶ V/m). Akụkụ seramiiki nchekwa ESD gụnyere ihe ndị na-eme ihe njedebe, pin elu, rail nduzi, na ihe ndozi ahaziri maka akpaaka FAB.
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Akụkụ Seramiiki maka Ngwa Nnyocha Semiconductor
E ji igwe na-eme ka ihe dị n'ime seramiiki dị nro ma na-eme ka ọ dị ọcha n'okpuru okpomọkụ dị elu, wee jiri ya mee ihe nke ọma, akụkụ seramiiki ndị ahụ nwere ike imezu ihe achọrọ siri ike nke ngwaọrụ semiconductor, ya na atụmatụ ya dịka iguzogide iyi, iguzogide nchara, obere mgbasawanye okpomọkụ, na mkpuchi. Seramiiki nwere ike ịrụ ọrụ n'ọtụtụ ụdị ngwa mmepụta semiconductor nwere oke okpomọkụ, ikuku ma ọ bụ gas na-emebi emebi ruo ogologo oge.
Ejiri ntụ ntụ alumina dị ọcha mee ya, nke a na-eji ịpị isostatic oyi, imecha okpomọkụ dị elu na imecha ihe ziri ezi, ọ nwere ike iru nha nha ruo ±0.001 mm, imecha elu Ra 0.1, iguzogide okpomọkụ 1600℃.
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Efere Seramiiki Semiconductor Ngwaọrụ Ibu
E ji igwe na-eme ka ihe dị n'ime seramiiki dị nro ma na-eme ka ọ dị ọcha n'okpuru okpomọkụ dị elu, wee jiri ya mee ihe nke ọma, akụkụ seramiiki ndị ahụ nwere ike imezu ihe achọrọ siri ike nke ngwaọrụ semiconductor, ya na atụmatụ ya dịka iguzogide iyi, iguzogide nchara, obere mgbasawanye okpomọkụ, na mkpuchi. Seramiiki nwere ike ịrụ ọrụ n'ọtụtụ ụdị ngwa mmepụta semiconductor nwere oke okpomọkụ, ikuku ma ọ bụ gas na-emebi emebi ruo ogologo oge.
Ejiri ntụ ntụ alumina dị ọcha mee ya, nke a na-eji ịpị isostatic oyi, imecha okpomọkụ dị elu na imecha ihe ziri ezi, ọ nwere ike iru nha nha ruo ±0.001 mm, imecha elu Ra 0.1, iguzogide okpomọkụ 1600℃.
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Ngwa Semiconductor Akụkụ Seramiiki
E ji igwe na-eme ka ihe dị n'ime seramiiki dị nro ma na-eme ka ọ dị ọcha n'okpuru okpomọkụ dị elu, wee jiri ya mee ihe nke ọma, akụkụ seramiiki ndị ahụ nwere ike imezu ihe achọrọ siri ike nke ngwaọrụ semiconductor, ya na atụmatụ ya dịka iguzogide iyi, iguzogide nchara, obere mgbasawanye okpomọkụ, na mkpuchi. Seramiiki nwere ike ịrụ ọrụ n'ọtụtụ ụdị ngwa mmepụta semiconductor nwere oke okpomọkụ, ikuku ma ọ bụ gas na-emebi emebi ruo ogologo oge.
Ejiri ntụ ntụ alumina dị ọcha mee ya, nke a na-eji ịpị isostatic oyi, imecha okpomọkụ dị elu na imecha ihe ziri ezi, ọ nwere ike iru nha nha ruo ±0.001 mm, imecha elu Ra 0.1, iguzogide okpomọkụ 1600℃.
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Mgbaaka Akara Alumina nke Dị Ọcha Dị Elu maka Mmechi Ụlọ Okpomọkụ Dị Elu
Emebere mgbanaka seramiiki nke St.Cera dị ka ihe ọzọ maka mgbanaka O-mgbanaka polima n'ebe dị oke njọ ebe elastomers na-emebi emebi. Ejiri 99.8% alumina dị ọcha (Al₂O₃) rụọ mgbanaka akara siri ike a, a na-eji ya eme ihe n'ime ngwa mkpuchi static - nke a na-ejikọkarị ya na gasket metal ma ọ bụ graphite dị nro - iji nye oghere ikuku ma ọ bụ gas a pụrụ ịdabere na ya na okpomọkụ ruo 800°C na gburugburu plasma ma ọ bụ kemịkalụ siri ike. Ihe a na-enye enweghị gas na-apụ apụ, ike nrụgide dị elu (ike flexural dị n'okpuru 361 MPa), na enweghị ike kemịkalụ (na-eguzogide halogens, asịd, na alkalis ma e wezụga HF). Ebe mkpuchi a na-emechi emechi (ịdị larịị ≤5 μm, oke iru ala Ra ≤0.2 μm) na-eme ka ọ dị mfe ịnweta njikọ na ihe ndị mejupụtara ígwè ma ọ bụ seramiiki.
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Mgbaaka Lekwasị Anya nke Alumina Chamber dị Elu maka Plasma Etch & CVD Systems
Mgbaaka nchekwa ụlọ St.Cera bụ ihe dị mkpa eji arụ ọrụ dị mkpa na ngwa plasma etch, CVD, na PVD semiconductor. Ejiri 99.8% alumina dị ọcha (Al₂O₃) rụọ ya, mgbanaka ahụ gbara nsọtụ wafer gburugburu iji gbochie plasma ma melite nkesa ion n'akụkụ, si otú a na-eme ka nha nha etch dị n'elu wafer ahụ ka mma. Ihe a na-enye ike pụrụ iche nke plasma, ike dielectric dị elu (15×10⁶ V/m), na nkwụsi ike okpomọkụ ruo 1600°C, na-eme ka a pụrụ ịtụkwasị obi ogologo oge na gburugburu plasma dị ike nke fluorine ma ọ bụ chlorine. ID/OD na flatness (≤10 μm) na-eme ka nhazi akụkụ wafer ziri ezi, na-ebelata ntụpọ akụkụ na mmepụta ihe.
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Mgbaaka Ceramic Alumina Dị Ọcha Dị Elu Maka Ụlọ Usoro CVD / PVD
Emebere mgbanaka seramiiki nke St.Cera kpọmkwem maka iji ya na ụlọ ọrụ nhazi CVD (Chemical Vapor Deposition) na PVD (Physical Vapor Deposition). Ejiri 99.8% alumina dị ọcha (Al₂O₃) mepụta mgbanaka a, ọ na-eje ozi dị ka ihe mkpuchi ụlọ, mgbanaka lekwasịrị anya, ma ọ bụ ihe mejupụtara ngwa nhazi iji gbochie plasma ma chebe mgbidi ụlọ site na mbuze. Ihe a na-enye ezigbo iguzogide plasma, ike dielectric dị elu (15×10⁶ V/m), yana nkwụsi ike okpomọkụ ruo 1600°C, na-eme ka ndụ ogologo oge dị na gburugburu plasma dabere na fluorine dị ike. Ndozi nha ziri ezi (±0.05 mm na ID/OD) na ịdị larịị (≤10 μm) na-eme ka ọnọdụ akụkụ wafer na-aga n'ihu, na-eme ka nha nha nke ihe ndị dị n'ime ya dịkwuo mma ma na-ebelata mmepụta ihe ndị dị n'ime ya.
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Ihe na-eme ka ihe na-esi ísì ụtọ nke Bernoulli pụta — Njikwa Wafer na-anaghị emetụ aka maka Wafers dị gịrịgịrị na ndị na-adịghị ike
Ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe ghara imetụ aka. E ji ihe dị ọcha nke 99.8% alumina (Al₂O₃) ma ọ bụ silicon carbide (SiC) rụọ ya, o nwere ihe ndị e ji ígwè rụọ nke ọma nke na-ewepụta gas a rụnyere n'ọkụ iji mepụta ihe nkiri ikuku dị gịrịgịrị n'etiti ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe ghara imetụ aka. Ụkpụrụ a na-anaghị emetụ aka na-ewepụ mmetọ azụ, mgbawa n'akụkụ, na mmebi elu, na-eme ka ọ dị mma maka obere (≤100 μm), obere wafer, ma ọ bụ gbagọrọ agbagọ. Ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe ghara imetụ aka nke ọma (361 MPa maka Al₂O₃; ruo 550–600 MPa maka SiC), obere oke, na nkwụsi ike dị mma, na-eme ka e nwee ike imegharị ya na robot ndị na-ebufe wafer ọsọ ọsọ.
