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  • Nā ʻāpana keramika Alumina maʻamau no nā lako Semiconductor a me nā lako ʻoihana

    Nā ʻāpana keramika Alumina maʻamau no nā lako Semiconductor a me nā lako ʻoihana

    Hana ʻo St.Cera i nā ʻāpana keramika maʻamau mai ka 99.8% alumina maʻemaʻe kiʻekiʻe (Al₂O₃) e like me nā kiʻi a nā mea kūʻai aku. Ua lako kā mākou hale hana me nā mīkini wili pololei a me nā kikowaena mīkini CNC, e hiki ai ke hana i nā ʻāpana keramika paʻakikī me ka pololei kiʻekiʻe. ʻO nā ʻāpana maʻamau e pili ana i nā insulators, nā pōpō bearing, nā apo sila, nā bushings, nā mea paʻa maʻamau, a me nā geometries paʻakikī. Kākoʻo kā mākou hiki ke hana.

  • ʻO ka nozzle keramika Alumina no ka hoʻokomo ʻana i ke kinoea/wai wela kiʻekiʻe

    ʻO ka nozzle keramika Alumina no ka hoʻokomo ʻana i ke kinoea/wai wela kiʻekiʻe

    Ua hana pololei ʻia ka nozzle keramika a St.Cera mai ka 99.8% alumina maʻemaʻe kiʻekiʻe (Al₂O₃), e hāʻawi ana i ke kūpaʻa kiʻekiʻe o ka ʻaʻahu (Vickers 16 GPa), ka inertness kemika, a me ke kūpaʻa wela a hiki i ka 1600°C. Loaʻa i kā mākou mau hiki ke hana pololei i ke anawaena o loko e like me ka liʻiliʻi o 0.2mm, me ka pololei o 0.005mm a me ka concentricity o 0.01mm, e hōʻoiaʻiʻo ana i ke kahe mau a me ka hoʻolaha pololei o ka wai/kinoea. Loaʻa i ka nozzle kahi lua kūloko maʻemaʻe me ka hoʻopau ʻili Ra0.1, e hoʻemi ana i ke kūpaʻa kahe a me ka hōʻemi ʻana i ka clogging. ʻO ke anawaena orifice mai 0.2mm a i 5.0mm, me nā geometries maʻamau e pili ana i nā puka pololei, tapered, a i ʻole multi-orifice. Nānā ʻia kēlā me kēia nozzle ma ke ʻano a nānā ʻia no ke kūlike o ke kahe.

  • Papa Wili ʻAlumina Ceramic Kiʻekiʻe-Maʻemaʻe no ka Lapping Precision

    Papa Wili ʻAlumina Ceramic Kiʻekiʻe-Maʻemaʻe no ka Lapping Precision

    Hana ʻia ka papa wili keramika a St.Cera mai ka 99.8% alumina maʻemaʻe kiʻekiʻe (Al₂O₃) no ka lapping pololei a me nā noi wili. Loaʻa i kā mākou hiki ke wili pololei ka pālahalaha o 0.003mm, parallelism o 0.002mm, a me ka hoʻopau ʻili o Ra0.1, e hōʻoiaʻiʻo ana i ka wehe like ʻana o nā mea ma ka ʻili holoʻokoʻa o ka papa. Hāʻawi ka papa i ke kūpaʻa ʻaʻahu maikaʻi loa (Vickers 16 GPa), ka ikaika flexural kiʻekiʻe (361 MPa), a me ke kūpaʻa wela a hiki i 800°C. Loaʻa i nā ʻano poepoe a hiki i ke anawaena 600mm a me nā papa rectangular a hiki i ka lōʻihi 1500mm. Loaʻa nā ʻili grooved (ka laulā groove 0.5–2.0mm) no ka hoʻolaha slurry i nā kaʻina hana lapping. Nānā ʻia kēlā me kēia papa me ka laser interferometer a hāʻawi ʻia me kahi hōʻike ana pololei.

     

  • ʻO ka mea hoʻopau hopena seramika alumina maʻemaʻe kiʻekiʻe no nā robots lawelawe wafer

    ʻO ka mea hoʻopau hopena seramika alumina maʻemaʻe kiʻekiʻe no nā robots lawelawe wafer

    Ua hana pololei ʻia ka hopena hopena alumina ceramic a St.Cera mai ka 99.8% Al₂O₃ kiʻekiʻe-maʻemaʻe me ka hoʻohana ʻana i nā lako wili CNC 5-axis holomua. ʻO kā mākou mau hiki ke hana ʻana e komo pū me nā mīkini wili pololei a me nā kikowaena mīkini CNC, e hiki ai ke hana i nā geometries paʻakikī me ka pololei kiʻekiʻe. Hōʻike ka hopena hopena i kahi ʻano lahilahi (lahilahi e like me 1.5 mm) me kahi lihi alakaʻi tapered no ka hoʻokomo wafer laumania. Hāʻawi ka mea i ka paʻakikī kiʻekiʻe (Young's modulus 380 GPa), ke kūpaʻa ʻana i ka ʻaʻahu maikaʻi loa, a me ke kūpaʻa wela a hiki i 800°C. Hoʻowali pololei ʻia kēlā me kēia ʻāpana e hoʻokō i ka pālahalaha o 0.003mm, parallelism o 0.002mm, a me ka hoʻopau ʻana o ka ʻili o Ra0.1, e hōʻoiaʻiʻo ana i ka pili wafer kūlike a me ka hana ʻole o nā ʻāpana i nā wahi semiconductor FAB. Loaʻa i nā lōʻihi mai 150 mm a 450 mm, me nā geometries tip maʻamau (edge ​​grip, Bernoulli, flat) a me nā flanges kau e kūpono i nā robots OEM. ʻO nā koho hoʻopau ʻili e komo pū me ka uhi lapped, polished, a i ʻole ka uhi dissipative ESD (10⁶–10⁹ Ω/sq).

  • ʻO Alumina Vacuum Chuck no ka Precision Dicing & Grinding

    ʻO Alumina Vacuum Chuck no ka Precision Dicing & Grinding

    Hana ʻia ka ʻūpā vacuum alumina a St.Cera mai ka 99.8% Al₂O₃ kiʻekiʻe me nā ʻauwaha vacuum i hana pololei ʻia. Loaʻa i kā mākou hiki ke wili pololei ka palahalaha o 0.003mm a me ka parallelism o 0.002mm, e hōʻoiaʻiʻo ana i ka hoʻopaʻa ʻana o ka wafer warp-free i ka wā o ka dicing, ka wili ʻana i hope, a me ka nānā ʻana. Hāʻawi ka mea i ka ikaika flexural kiʻekiʻe (361 MPa), ka paʻakikī (16 GPa), a me ke kūpaʻa wela a hiki i 800°C. Loaʻa i nā ʻano poepoe a hiki i ke anawaena waho 600mm (OD) a me nā ʻano rectangular a hiki i ka lōʻihi 1500mm. Hoʻolālā kūikawā ʻia nā ʻauwaha vacuum (concentric, radial, a i ʻole nā ​​​​​​ʻano grid) e kūpono i nā koi hana kikoʻī. Nānā ʻia kēlā me kēia ʻūpā me ka laser interferometer a hāʻawi ʻia me kahi hōʻike hōʻoia palahalaha.

  • ʻO ka Porous SiC Vacuum Chuck i kākoʻo ʻia e ka Metal no ka lawelawe ʻana i ka wafer Warped & Thin

    ʻO ka Porous SiC Vacuum Chuck i kākoʻo ʻia e ka Metal no ka lawelawe ʻana i ka wafer Warped & Thin

    Hoʻohui ka mīkini hoʻomaʻemaʻe keramika metala a St.Cera i kahi papa keramika porous silicon carbide (SiC) me kahi kumu metala i hana ʻia me ka mīkini kikoʻī (alumini a kila kila ʻole paha). Hāʻawi ka mea porous SiC (uliuli-ʻeleʻele, porosity 35-40%, nui o ka pore 20-30 μm, permeability 60 ml/cm²·min) i ka hoʻolaha like ʻana o ka vacuum ma ka ʻili wafer holoʻokoʻa, e hoʻopau ana i ka māka lihi a hiki ke kākoʻo ʻole i ka hoʻopili ʻana no nā wafers lahilahi (≤100 μm) a i ʻole nā ​​​​wafers warped. Hāʻawi ka papa SiC i ka hoʻonui wela haʻahaʻa (3.5 × 10⁻⁶/℃), kūpaʻa wela a hiki i 1000°C, a me ka ikaika flexural kūpono (32-35 MPa). Hoʻohui ke kumu metala i ka paʻakikī o ke kūkulu ʻana, ka maʻalahi o ke kau ʻana ma o nā lua wili, a me ka pale ʻana i ka haki brittle. He kūpono kēia chuck no ka wili ʻana i ka ʻaoʻao hope, dicing, a me ka hana wafer wela kiʻekiʻe kahi e koʻikoʻi ai ka vacuum like a me ka hoʻohālikelike wela.

     

  • Papa Seramika Alumina Maʻemaʻe Kiʻekiʻe - no ka Insulation a me nā Mea Hana Mahana Kiʻekiʻe

    Papa Seramika Alumina Maʻemaʻe Kiʻekiʻe - no ka Insulation a me nā Mea Hana Mahana Kiʻekiʻe

    Hana ʻia ka pā keramika a St.Cera mai ka 99.8% alumina maʻemaʻe kiʻekiʻe (Al₂O₃), e hāʻawi ana i ka ikaika dielectric kiʻekiʻe (15 × 10⁶ V/m), ke kūpaʻa wela a hiki i 1600 °C, a me ke kūpaʻa ʻana i ka ʻaʻahu maikaʻi loa. Hoʻopili pololei ʻia nā pā e hoʻokō i ka pālahalaha ≤5 μm ma luna o 100 mm a me ka ʻoʻoleʻa o ka ʻili Ra ≤0.4 μm. Loaʻa i nā mānoanoa maʻamau mai 1 mm a 20 mm, nā nui maʻamau a hiki i 500 × 500 mm. Hoʻohana ʻia ma ke ʻano he mau mea hoʻokaʻawale uila, nā kumu hoʻomehana, nā liner keʻena, a me nā substrates vacuum chuck.

  • ʻO ke koʻokoʻo wahi keramika alumina kikoʻī no nā mea hoʻopaʻa semiconductor

    ʻO ke koʻokoʻo wahi keramika alumina kikoʻī no nā mea hoʻopaʻa semiconductor

    ʻO ke koʻokoʻo wahi keramika a St.Cera i wili pololei ʻia mai ka 99.8% alumina maʻemaʻe kiʻekiʻe (Al₂O₃). Hāʻawi ia i ka paʻakikī kiʻekiʻe (16 GPa), ke kūpaʻa maikaʻi loa i ka ʻaʻahu ʻana, a me ke kūpaʻa o ka dimensional. ʻO ke anawaena e like me ka paʻa o ±0.005 mm, ka lōʻihi a hiki i 150 mm. Hoʻopili ʻia ka ʻili o ke koʻokoʻo iā Ra ≤0.2 μm no ka hoʻokomo maʻalahi a me ka wehe ʻana. Hoʻohana ʻia ma ke ʻano he mau pine alignment, nā pine dowel, a i ʻole nā ​​​​​​mea hoʻōki kūlana i nā mea hana semiconductor, nā cassettes wafer, a me nā lako nānā.

  • ʻO ke koʻokoʻo seramika Zirconia ikaika kiʻekiʻe - no nā ʻauamo a me nā punches kikoʻī

    ʻO ke koʻokoʻo seramika Zirconia ikaika kiʻekiʻe - no nā ʻauamo a me nā punches kikoʻī

    ʻO ke koʻokoʻo keramika zirconia a St.Cera i wili pololei ʻia mai ka yttria-stabilized ZrO₂. Hāʻawi ia i ka ikaika flexural kūikawā (1000 MPa), ka paʻakikī haki (5–8 MPa·m¹/²), a me ka paʻakikī Vickers (13 GPa). He ʻano ʻeleʻele a keʻokeʻo paha ke koʻokoʻo, ʻo ka density he 6.03 g/cm³, a ʻaʻohe porosity. ʻO ke anawaena mai 1 mm a 50 mm, ka lōʻihi a hiki i 200 mm, me ka hoʻomanawanui e like me ka ±0.005 mm. Hoʻopau ʻia ka ʻili i Ra ≤0.2 μm. Kūpono no nā noi kiʻekiʻe e like me nā plunger, nā ʻauamo, nā pine dowel, a me nā blanks mea hana ʻoki.

     

  • Nā ʻĀpana Seramika Zirconia Paʻa ʻo Yttria - Paʻakikī kiʻekiʻe a me ke kūpaʻa ʻana i ka ʻaʻahu

    Nā ʻĀpana Seramika Zirconia Paʻa ʻo Yttria - Paʻakikī kiʻekiʻe a me ke kūpaʻa ʻana i ka ʻaʻahu

    Hana ʻo St.Cera i nā ʻāpana keramika zirconia maʻamau me ka hoʻohana ʻana i ka yttria-stabilized ZrO₂ (Y-TZP). Hāʻawi kēia mea i ka ikaika flexural kūikawā (1000 MPa), ka paʻakikī haki kiʻekiʻe (5–8 MPa·m¹/²), a me ka paʻakikī Vickers o 13 GPa. ʻO ka density he 6.03 g/cm³, me ka ʻole o ka omo wai. Hiki ke hoʻolako ʻia nā ʻāpana i ke kala keʻokeʻo a ʻeleʻele paha. Hāʻawi ka mīkini hoʻoikaika hoʻololi kū hoʻokahi o Zirconia i ke kūpaʻa maikaʻi loa i ka laha ʻana o ka māwae, e kūpono ai no nā ʻāpana i pili i ka hopena, ka haʻalulu wela, a i ʻole ke kaumaha kiʻekiʻe. ʻO nā ʻāpana maʻamau e komo pū me nā noho valve, nā plungers pump, nā pine alakaʻi fiber, nā mea ʻoki, a me nā bushings pale ʻaʻahu.

  • Nā ʻāpana seramika Alumina 99.5% i hoʻopilikino ʻia ʻo ST.CERA

    Nā ʻāpana seramika Alumina 99.5% i hoʻopilikino ʻia ʻo ST.CERA

    ʻO nā ʻāpana kūkulu seramika kahi huaʻōlelo maʻamau o nā ʻano paʻakikī like ʻole o nā ʻāpana seramika. Hana ʻia me ka pauka seramika maʻemaʻe kiʻekiʻe, hana ʻia nā ʻāpana seramika ma ke kaomi maloʻo a i ʻole ke kaomi isostatic anuanu, a sintered ma lalo o ke ana wela kiʻekiʻe, a laila mīkini pololei. Hoʻohana nui ʻia ia i nā lako semiconductor, kamaʻilio optical, laser, lako lapaʻau, petroleum, metallurgy, electronics me kona mau hiʻohiʻona e like me ke kū'ē ʻana i ke ana wela kiʻekiʻe, ke kū'ē ʻana i ka corrosion, ke kū'ē ʻana i ka abrasion a me ka insulation.

  • Nā ʻāpana seramika Alumina 99.5% i hoʻopilikino ʻia ʻo ST.CERA

    Nā ʻāpana seramika Alumina 99.5% i hoʻopilikino ʻia ʻo ST.CERA

    ʻO nā ʻāpana kūkulu seramika kahi huaʻōlelo maʻamau o nā ʻano paʻakikī like ʻole o nā ʻāpana seramika. Hoʻohana nui ʻia ia i nā lako semiconductor, kamaʻilio optical, laser, lako lapaʻau, petroleum, metallurgy, nā ʻoihana uila me kona mau hiʻohiʻona e like me ke kūpaʻa wela kiʻekiʻe, ke kūpaʻa corrosion, ke kūpaʻa abrasion a me ka insulation.

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