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ʻO ke apo hoʻokaʻawale PVD Alumina no nā ʻōnaehana hoʻokaʻawale vapor kino
Hana ʻia ke apo hoʻokaʻawale PVD a St.Cera mai ka 99.8% alumina maʻemaʻe kiʻekiʻe (Al₂O₃) no ka hoʻohana ʻana i nā ʻōnaehana hoʻokaʻawale mahu kino (PVD). Hāʻawi ke apo i ka hoʻokaʻawale uila ma waena o nā ʻāpana keʻena, e pale ana i ka arcing a me ka hōʻoia ʻana i ka hana plasma paʻa. ʻO nā waiwai koʻikoʻi e komo pū me ka ikaika dielectric kiʻekiʻe (15 × 10⁶ V / m), ke kū'ē kikoʻī >10¹⁴ Ω·mm² / m, a me ke kūpaʻa wela a hiki i 1600 ° C. Loaʻa i kā mākou mau hiki ke hana mīkini pololei nā diameters waho a hiki i 600mm, nā diameters o loko a hiki i 0.2mm, ka palahalaha o 0.003mm, a me ka hoʻopau ʻana o ka ʻili Ra0.1. ʻO ka porosity zero a me ka inertness kemika o ke apo e hōʻoiaʻiʻo i ka hilinaʻi lōʻihi i nā wahi sputtering aggressive.
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Nā ʻĀpana Keramika Alumina no nā ʻōnaehana hoʻoheheʻe E-Gun
Hana ʻo St.Cera i nā ʻāpana keramika alumina 99.8% kiʻekiʻe i hoʻolālā kūikawā ʻia no nā ʻōnaehana hoʻoheheʻe kukuna uila (E-gun). ʻO kēia mau ʻāpana e komo pū me nā liners ipu hao, nā pale pale kukuna, nā insulators, a me nā mea paʻa. Hāʻawi ka mea i ka ikaika dielectric kiʻekiʻe (15 × 10⁶ V / m), ke kūpaʻa wela a hiki i 1600 ° C, a me ke kūpaʻa maikaʻi loa i ka haʻalulu wela a me ka hoʻouka kemika mai nā mea i hoʻoheheʻe ʻia. Hoʻokō kā mākou mau hiki ke hana mīkini pololei i nā geometries paʻakikī me ka nui o ka hiʻohiʻona liʻiliʻi he 0.2mm, ka pālahalaha 0.003mm, a me ka hoʻopau ʻili Ra0.1. Ua nānā ʻia kēlā me kēia ʻāpana he 100% CMM no ka pololei o ka dimensional.
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Papa Keramika Alumina Hoʻonohonoho Nui no nā Mea Hana Semiconductor a me nā Mea Hana ʻOihana
Hana ʻo St.Cera i nā papa keramika nui mai ka 99.8% alumina maʻemaʻe kiʻekiʻe (Al₂O₃) me nā ana kiʻekiʻe a hiki i ka 1500mm ka lōʻihi a me 600mm ka laulā. Loaʻa i kā mākou hiki ke wili pololei i ka pālahalaha o 0.003mm ma luna o 100mm a me ka parallelism o 0.002mm, e hōʻoiaʻiʻo ana i ka maikaʻi o ka ʻili no nā noi ʻāpana nui. ʻO ka mānoanoa a hiki i ka 100mm, ka hoʻopau ʻana o ka ʻili a hiki i Ra0.1. Hana kēia mau papa ma ke ʻano he kumu chuck vacuum, nā platens hoʻomehana, nā panela insulation uila, a me nā papahele keʻena hana i ka semiconductor, ka hōʻike, a me ka hana photovoltaic. Loaʻa nā lua ma o nā lua, nā counterbores, a me ka profiling lihi.
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Apo Keramika Alumina Precision no ke Sila ʻana, ka Hoʻokaʻawale ʻana a me ka Hoʻopaʻa ʻana
Ua hana pololei ʻia ke apo keramika a St.Cera mai ka 99.8% alumina maʻemaʻe kiʻekiʻe (Al₂O₃) no nā noi e pono ai ke kūpaʻa kiʻekiʻe i ka ʻaʻahu, ka insulation uila, a me ke kūpaʻa wela a hiki i ka 1600°C. Kākoʻo kā mākou hiki ke hana i nā diameters waho a hiki i ka 600mm, ka mānoanoa a hiki i ka 100mm, a me nā diameters o loko e like me ka liʻiliʻi e like me 0.2mm, me ka pālahalaha o 0.003mm, parallelism o 0.002mm, a me ka concentricity o 0.01mm. Loaʻa ma ke ʻano he apo sila, nā apo spacer, nā apo paʻa, a i ʻole nā kikona maʻamau. ʻO ka porosity ʻole o ka mea a me ka inertness kemika e kūpono ia no nā kemika aggressive a me nā wahi plasma.
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ʻO ka paipu seramika alumina maʻemaʻe kiʻekiʻe no nā wahi mahana kiʻekiʻe a me nā ʻino
Hana ʻia ka paipu keramika a St.Cera mai ka 99.8% alumina maʻemaʻe kiʻekiʻe (Al₂O₃), e hāʻawi ana i ke kūpaʻa wela maikaʻi loa a hiki i ka 1600°C, ka ikaika dielectric kiʻekiʻe (15 × 10⁶ V/m), a me ke kūpaʻa kemika kiʻekiʻe. ʻO kā mākou mau hiki ke hana pololei i nā anawaena o loko e like me ka liʻiliʻi o 0.2mm, nā anawaena o waho a hiki i ka 600mm, a me ka lōʻihi a hiki i ka 1500mm, me ka pololei o 0.005mm, ka concentricity o 0.01mm, a me ka hoʻopau ʻana o ka ʻili o Ra0.1. ʻO ka porosity ʻole o ka paipu (0% omo wai) e pale aku i ka outgassing i nā wahi vacuum, e kūpono ai no nā umu hoʻolaha semiconductor, ka pale thermocouple, a me ka hana kemika. Loaʻa nā mānoanoa o ka paia maʻamau a me nā hoʻonohonoho hopena (pālahalaha, tapered, flanged).
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Nā ʻāpana keramika Alumina maʻamau no nā lako Semiconductor a me nā lako ʻoihana
Hana ʻo St.Cera i nā ʻāpana keramika maʻamau mai ka 99.8% alumina maʻemaʻe kiʻekiʻe (Al₂O₃) e like me nā kiʻi a nā mea kūʻai aku. Ua lako kā mākou hale hana me nā mīkini wili pololei a me nā kikowaena mīkini CNC, e hiki ai ke hana i nā ʻāpana keramika paʻakikī me ka pololei kiʻekiʻe. ʻO nā ʻāpana maʻamau e pili ana i nā insulators, nā pōpō bearing, nā apo sila, nā bushings, nā mea paʻa maʻamau, a me nā geometries paʻakikī. Kākoʻo kā mākou hiki ke hana.
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ʻO ka nozzle keramika Alumina no ka hoʻokomo ʻana i ke kinoea/wai wela kiʻekiʻe
Ua hana pololei ʻia ka nozzle keramika a St.Cera mai ka 99.8% alumina maʻemaʻe kiʻekiʻe (Al₂O₃), e hāʻawi ana i ke kūpaʻa kiʻekiʻe o ka ʻaʻahu (Vickers 16 GPa), ka inertness kemika, a me ke kūpaʻa wela a hiki i ka 1600°C. Loaʻa i kā mākou mau hiki ke hana pololei i ke anawaena o loko e like me ka liʻiliʻi o 0.2mm, me ka pololei o 0.005mm a me ka concentricity o 0.01mm, e hōʻoiaʻiʻo ana i ke kahe mau a me ka hoʻolaha pololei o ka wai/kinoea. Loaʻa i ka nozzle kahi lua kūloko maʻemaʻe me ka hoʻopau ʻili Ra0.1, e hoʻemi ana i ke kūpaʻa kahe a me ka hōʻemi ʻana i ka clogging. ʻO ke anawaena orifice mai 0.2mm a i 5.0mm, me nā geometries maʻamau e pili ana i nā puka pololei, tapered, a i ʻole multi-orifice. Nānā ʻia kēlā me kēia nozzle ma ke ʻano a nānā ʻia no ke kūlike o ke kahe.
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Papa Wili ʻAlumina Ceramic Kiʻekiʻe-Maʻemaʻe no ka Lapping Precision
Hana ʻia ka papa wili keramika a St.Cera mai ka 99.8% alumina maʻemaʻe kiʻekiʻe (Al₂O₃) no ka lapping pololei a me nā noi wili. Loaʻa i kā mākou hiki ke wili pololei ka pālahalaha o 0.003mm, parallelism o 0.002mm, a me ka hoʻopau ʻili o Ra0.1, e hōʻoiaʻiʻo ana i ka wehe like ʻana o nā mea ma ka ʻili holoʻokoʻa o ka papa. Hāʻawi ka papa i ke kūpaʻa ʻaʻahu maikaʻi loa (Vickers 16 GPa), ka ikaika flexural kiʻekiʻe (361 MPa), a me ke kūpaʻa wela a hiki i 800°C. Loaʻa i nā ʻano poepoe a hiki i ke anawaena 600mm a me nā papa rectangular a hiki i ka lōʻihi 1500mm. Loaʻa nā ʻili grooved (ka laulā groove 0.5–2.0mm) no ka hoʻolaha slurry i nā kaʻina hana lapping. Nānā ʻia kēlā me kēia papa me ka laser interferometer a hāʻawi ʻia me kahi hōʻike ana pololei.
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ʻO ka mea hoʻopau hopena seramika alumina maʻemaʻe kiʻekiʻe no nā robots lawelawe wafer
Ua hana pololei ʻia ka hopena hopena alumina ceramic a St.Cera mai ka 99.8% Al₂O₃ kiʻekiʻe-maʻemaʻe me ka hoʻohana ʻana i nā lako wili CNC 5-axis holomua. ʻO kā mākou mau hiki ke hana ʻana e komo pū me nā mīkini wili pololei a me nā kikowaena mīkini CNC, e hiki ai ke hana i nā geometries paʻakikī me ka pololei kiʻekiʻe. Hōʻike ka hopena hopena i kahi ʻano lahilahi (lahilahi e like me 1.5 mm) me kahi lihi alakaʻi tapered no ka hoʻokomo wafer laumania. Hāʻawi ka mea i ka paʻakikī kiʻekiʻe (Young's modulus 380 GPa), ke kūpaʻa ʻana i ka ʻaʻahu maikaʻi loa, a me ke kūpaʻa wela a hiki i 800°C. Hoʻowali pololei ʻia kēlā me kēia ʻāpana e hoʻokō i ka pālahalaha o 0.003mm, parallelism o 0.002mm, a me ka hoʻopau ʻana o ka ʻili o Ra0.1, e hōʻoiaʻiʻo ana i ka pili wafer kūlike a me ka hana ʻole o nā ʻāpana i nā wahi semiconductor FAB. Loaʻa i nā lōʻihi mai 150 mm a 450 mm, me nā geometries tip maʻamau (edge grip, Bernoulli, flat) a me nā flanges kau e kūpono i nā robots OEM. ʻO nā koho hoʻopau ʻili e komo pū me ka uhi lapped, polished, a i ʻole ka uhi dissipative ESD (10⁶–10⁹ Ω/sq).
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ʻO Alumina Vacuum Chuck no ka Precision Dicing & Grinding
Hana ʻia ka ʻūpā vacuum alumina a St.Cera mai ka 99.8% Al₂O₃ kiʻekiʻe me nā ʻauwaha vacuum i hana pololei ʻia. Loaʻa i kā mākou hiki ke wili pololei ka palahalaha o 0.003mm a me ka parallelism o 0.002mm, e hōʻoiaʻiʻo ana i ka hoʻopaʻa ʻana o ka wafer warp-free i ka wā o ka dicing, ka wili ʻana i hope, a me ka nānā ʻana. Hāʻawi ka mea i ka ikaika flexural kiʻekiʻe (361 MPa), ka paʻakikī (16 GPa), a me ke kūpaʻa wela a hiki i 800°C. Loaʻa i nā ʻano poepoe a hiki i ke anawaena waho 600mm (OD) a me nā ʻano rectangular a hiki i ka lōʻihi 1500mm. Hoʻolālā kūikawā ʻia nā ʻauwaha vacuum (concentric, radial, a i ʻole nā ʻano grid) e kūpono i nā koi hana kikoʻī. Nānā ʻia kēlā me kēia ʻūpā me ka laser interferometer a hāʻawi ʻia me kahi hōʻike hōʻoia palahalaha.
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ʻO ka Porous SiC Vacuum Chuck i kākoʻo ʻia e ka Metal no ka lawelawe ʻana i ka wafer Warped & Thin
Hoʻohui ka mīkini hoʻomaʻemaʻe keramika metala a St.Cera i kahi papa keramika porous silicon carbide (SiC) me kahi kumu metala i hana ʻia me ka mīkini kikoʻī (alumini a kila kila ʻole paha). Hāʻawi ka mea porous SiC (uliuli-ʻeleʻele, porosity 35-40%, nui o ka pore 20-30 μm, permeability 60 ml/cm²·min) i ka hoʻolaha like ʻana o ka vacuum ma ka ʻili wafer holoʻokoʻa, e hoʻopau ana i ka māka lihi a hiki ke kākoʻo ʻole i ka hoʻopili ʻana no nā wafers lahilahi (≤100 μm) a i ʻole nā wafers warped. Hāʻawi ka papa SiC i ka hoʻonui wela haʻahaʻa (3.5 × 10⁻⁶/℃), kūpaʻa wela a hiki i 1000°C, a me ka ikaika flexural kūpono (32-35 MPa). Hoʻohui ke kumu metala i ka paʻakikī o ke kūkulu ʻana, ka maʻalahi o ke kau ʻana ma o nā lua wili, a me ka pale ʻana i ka haki brittle. He kūpono kēia chuck no ka wili ʻana i ka ʻaoʻao hope, dicing, a me ka hana wafer wela kiʻekiʻe kahi e koʻikoʻi ai ka vacuum like a me ka hoʻohālikelike wela.
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Papa Seramika Alumina Maʻemaʻe Kiʻekiʻe - no ka Insulation a me nā Mea Hana Mahana Kiʻekiʻe
Hana ʻia ka pā keramika a St.Cera mai ka 99.8% alumina maʻemaʻe kiʻekiʻe (Al₂O₃), e hāʻawi ana i ka ikaika dielectric kiʻekiʻe (15 × 10⁶ V/m), ke kūpaʻa wela a hiki i 1600 °C, a me ke kūpaʻa ʻana i ka ʻaʻahu maikaʻi loa. Hoʻopili pololei ʻia nā pā e hoʻokō i ka pālahalaha ≤5 μm ma luna o 100 mm a me ka ʻoʻoleʻa o ka ʻili Ra ≤0.4 μm. Loaʻa i nā mānoanoa maʻamau mai 1 mm a 20 mm, nā nui maʻamau a hiki i 500 × 500 mm. Hoʻohana ʻia ma ke ʻano he mau mea hoʻokaʻawale uila, nā kumu hoʻomehana, nā liner keʻena, a me nā substrates vacuum chuck.
