Alumina Gas Distribution Plate for CVD/PVD Showerhead
St.Cera’s gas distribution plate (showerhead) is precision-machined from high-purity 99.8% alumina ceramic. It features an array of micro-holes (diameters 0.3–1.5 mm) that ensure uniform gas flow across the wafer surface during CVD, PVD, or ALD processes. The plate’s high dielectric strength (>15×10⁶ V/m) and plasma resistance make it essential for semiconductor thin-film deposition.
Specifications:
| Property | Value |
| Material | 99.8% Al₂O₃ or SiC |
| Diameter | 100 – 1500mm (round) or rectangular |
| Thickness | 5 – 20 mm |
| Hole Diameter | 0.3 – 1.5 mm |
| Hole Pattern | Custom (triangular, square, radial) |
| Flatness | ≤10 μm over full area |
| Surface Roughness | Ra ≤0.6 μm (gas side) |
| Open Area Ratio | 5–15% |
Applications:
PECVD showerhead plates
ALD gas injectors
Etch chamber gas distribution plates
MOCVD reactor components
Manufacturing:
Alumina substrate lapped flat → CNC drilling with diamond-coated tools (hole position tolerance ±0.02 mm) → deburring → ultrasonic cleaning → Class 100 packaging.
Quality Control:
Each plate is 100% inspected for hole size (vision system), flatness (laser interferometer), and gas flow uniformity (pressure mapping). No micro-cracks under 20x microscope.
Advantages over Metal Plates:
No metallic contamination in thin films
Lower particle generation (no corrosion flakes)
Withstands aggressive cleaning plasmas (CF₄, NF₃)
Custom Features:
Backside gas channels, counter-bored holes, edge seals, and different material grades (SiC for higher thermal conductivity, Y₂O₃ coating for plasma resistance).
We provide CAD verification and flow simulation prior to manufacturing.
